Application No./Patent No.: 2017100272724 Application date: 2017-01-13
Main classification number: B81C 1/00 applicant: Zeng Huan.
Inventor/Designer: Cao Yu, He An, Xue Wei, Liu Wenwen, Yang Huan, Sun Ke, Zhao Xiuju.
Description abstract
The invention provides a preparation method of a micro-nano self-assembly structure based on wettability control, which comprises the following steps: preparing a micro-nano self-assembly structure figure with a micro-nano rough structure inside the micro-nano self-assembly structure figure on the surface of a substrate by laser filling etching; The surface of the substrate was modified with N- isopropylacrylamide film. The unfilled scanned area in the first step is filled and polished by a pulsed laser beam scanning polishing process, so that the N- isopropylacrylamide film in the scanned area is completely removed by burning candles, and its surface roughness is less than that of the micro-nano rough structure obtained by laser filling etching, thereby preparing a self-defined and patterned micro-nano self-assembly structure. Compared with the traditional preparation process of micro-nano self-assembly structure based on IC process, the method provided by the invention has the advantages of simple steps, low process cost and high efficiency, and is especially suitable for the preparation of single/small batch and self-defined micro-nano self-assembly structure samples.
